The Global report on “Extreme Ultraviolet Lithography (EUVL) Market” delivering key insights and providing a competitive advantage to clients through a detailed report. The report also details the information about the global market status, growth rate, future trends, market drivers, challenges, opportunities and porter’s forces analysis with respect to these elements. An exclusive data offered in this report is collected by research and industry experts team.
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“The EUV lithography market is estimated to grow at a CAGR of 28.16% between 2018 and 2023.”
The EUV lithography market is emerging and is expected to grow further in the coming years. The market for EUV lithography is likely to be valued at USD 2.98 billion in 2018 and is expected to reach USD 10.31 billion by 2023, at a CAGR of 28.16% between 2018 and 2023. The factors that drive the market growth include the growing need for the trend of miniaturization and reduction in process complexity and cost. However, high price of EUV lithography systems may restrict the growth of the EUV lithography market.
“Market for foundry expected to grow at a higher CAGR during the forecast period.”
Usually, the volume of wafer processing at foundries is higher than that at IDMs. The foundry has a wide variety of requirements to address different customers. For instance, TSMC (Taiwan), a leading pure-play foundry, holds the largest revenue for wafer fabrication. On top of that, the increasing demand for advanced packaging for miniaturized devices is expected to be the key driver for the adoption of EUV lithography in foundries.
“Market in APAC is likely to account for the largest share in 2018”
Major drivers for the growth of the EUV lithography market in APAC are the growing number of wafer-processing capability and increasing demand from fab-less players at leading foundries in the region. TSMC (Taiwan), the world’s leading foundry acquiring more than 50% of the revenue, started investing in the expansion of its wafer-processing capability and planned to invest in EUV lithography. The foundry holds the highest number of wafer-processing capability than any other leading players in the semiconductor manufacturing industry.
Breakdown of the profile of primary participants:
- By Company: Tier 1 = 55%, Tier 2 =25%, and Tier 3 =20%
- By Designation: C-level Executives = 37%, Directors =36%, and Others =27%
- By Region: North America = 34%, EMEA= 35%, and APAC = 31 %
Major players profiled in this report include:
- ASML (Netherlands)
- Nikon (Japan)
- Canon (Japan)
- Carl Zeiss (Germany)
- Toppan Printing (Japan)
- NTT Advanced Technology (Japan)
- Samsung (South Korea)
- SK Hynix (South Korea)
- Intel (US)
- Toshiba (Japan)
- TSMC (Taiwan)
The study segments in the EUV lithography market report include equipment—light source, mirrors, mask, and others; end user—integrated device manufacturers (IDMs) and foundries. The study also covers applications and geographic forecast of the market size for various segments with regard to2main regions—the Americas and APAC.
Reasons to buy the report
The report would help the market leaders/new entrants in this market in the following ways:
- This report segments the EUV lithography market comprehensively and provides the closest approximations of the overall market size and those of the sub segments across different applications and regions.
- The report gives the detailed analysis of the EUV lithography market with the help of competitive landscape, value chain analysis, and impact analysis, including the key companies in the market and their relations in the ecosystem.
- The report helps stakeholders understand the pulse of the market and provides them the information on key drivers, restraints, challenges, and opportunities pertaining to the EUV lithography market.
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