High Purity Sputtering Target Material Market Expected to Witness a Sustainable Growth over 2028

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Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputter targets market.
In this report, we counted the high purity sputtering target material with 4N (purity?99.99%?
This report contains market size and forecasts of High Purity Sputtering Target Material in Global, including the following market information:
Global High Purity Sputtering Target Material Market Revenue, 2017-2022, 2023-2028, ($ millions)
Global top five companies in 2021 (%)
The global High Purity Sputtering Target Material market was valued at 2641.7 million in 2021 and is projected to reach US$ 3036.5 million by 2028, at a CAGR of 2.0% during the forecast period.
The U.S. Market is Estimated at $ Million in 2021, While China is Forecast to Reach $ Million by 2028.
Metal Sputtering Target Material Segment to Reach $ Million by 2028, with a % CAGR in next six years.
The global key manufacturers of High Purity Sputtering Target Material include Linde, Mitsui Mining & Smelting, JX Nippon Mining & Metals Corporation, Materion, Honeywell, Konfoong Materials International Co., Ltd, ULVAC, TOSOH and Luvata, etc. In 2021, the global top five players have a share approximately % in terms of revenue.

MARKET MONITOR GLOBAL, INC (MMG) has surveyed the High Purity Sputtering Target Material companies, and industry experts on this industry, involving the revenue, demand, product type, recent developments and plans, industry trends, drivers, challenges, obstacles, and potential risks.

Total Market by Segment:
Global High Purity Sputtering Target Material Market, by Type, 2017-2022, 2023-2028 ($ millions)
Global High Purity Sputtering Target Material Market Segment Percentages, by Type, 2021 (%)
– Metal Sputtering Target Material
– Alloy Sputtering Target Material
– Non-metal Sputtering Target Material
Global High Purity Sputtering Target Material Market, by Application, 2017-2022, 2023-2028 ($ millions)
Global High Purity Sputtering Target Material Market Segment Percentages, by Application, 2021 (%)
– Semiconductor
– Solar Energy
– Flat Panel Display
– HDD
– Others
Global High Purity Sputtering Target Material Market, By Region and Country, 2017-2022, 2023-2028 ($ Millions)
Global High Purity Sputtering Target Material Market Segment Percentages, By Region and Country, 2021 (%)
– North America
– – US
– – Canada
– – Mexico
– Europe
– – Germany
– – France
– – U.K.
– – Italy
– – Russia
– – Nordic Countries
– – Benelux
– – Rest of Europe
– Asia
– – China
– – Japan
– – South Korea
– – Southeast Asia
– – India
– – Rest of Asia
– South America
– – Brazil
– – Argentina
– – Rest of South America
– Middle East & Africa
– – Turkey
– – Israel
– – Saudi Arabia
– – UAE
– – Rest of Middle East & Africa

Competitor Analysis
The report also provides analysis of leading market participants including:
Key companies High Purity Sputtering Target Material revenues in global market, 2017-2022 (estimated), ($ millions)
Key companies High Purity Sputtering Target Material revenues share in global market, 2021 (%)

Further, the report presents profiles of competitors in the market, key players include:
– Linde
– Mitsui Mining & Smelting
– JX Nippon Mining & Metals Corporation
– Materion
– Honeywell
– Konfoong Materials International Co., Ltd
– ULVAC
– TOSOH
– Luvata
– Hitachi Metals
– LT Metal
– Sumitomo Chemical
– Plansee SE
– Fujian Acetron New Materials Co., Ltd
– FURAYA Metals Co., Ltd
– Luoyang Sifon Electronic Materials
– Changzhou Sujing Electronic Material
– Umicore
– GRIKIN Advanced Material Co., Ltd.
– Advantec
– Angstrom Sciences

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